Easy to use and compact in size, the SUSS MicroTec MJB3 represents the perfect system for laboratories and small-volume production. As an inexpensive photolithography solution, the MJB3 has set industry standards specifically for processing small substrates and pieces up to 100 mm. Equipped with a reliable, high-precision mask alignment and high-resolution printing capability in the submicron range, the MJB3 is unsurpassed by any comparable machine.

The Model 200 is a tabletop mask Aligner that requires minimal cleanroom space. It offers an economical alternative for R&D, or limited scale, pilot production. Utilising an innovative, air-bearing/vacuum chuck levelling system, the substrate is levelled quickly and gently for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one-micron resolution and alignment precision.

The alignment module features mask insert sets and quick-change wafer chucks that facilitate using various substrates and masks without requiring special tools for reconfiguration. The alignment module incorporates micrometres for the X, Y, and Z-axis. The Model 200 Mask Aligner features a dependable OAI UV Light Source, which provides collimated UV light in Near or Deep UV using lamps ranging in power from 200 to 2000 watts.

Dual-sensor optical feedback loops are linked to the constant intensity controller to provide control of exposure intensity within ±2% of the desired intensity. This Mask Aligner is a flexible, economical solution for any entry-level mask alignment and UV exposure application and is also available with a LED Light Source.

SUSS MicroTec‘s LabSpin platform represents the next generation of manual spin coater and developer systems that have been developed specifically for laboratory and R&D. Designed for various photolithography chemicals, LabSpin systems provide uniform, precise and repeatable spin coating results on the wafer through its advanced process chamber design.

The LabSpin is available in various versions, such as a tabletop and built-in unit. Built-in platforms are designed for integration into a wet bench and a glove box or are used in the SUSS LabCluster. LabSpin6 is suitable for round substrates up to 150 mm in diameter or square substrates up to 100x100 mm. LabSpin8 is suitable for round substrates up to 200 mm in diameter or square substrates up to 150x150 mm.

With a wide range of substrate holders, even fragments and unique shapes can be processed without problems. The LabSpin platform is characterised by a compact, space-saving design and requires little clean room space.

The large variety of LabSpin options allows a very wide range of applications. Coatings can be applied manually with syringes, semi-automatically with cartridges or with up to two fully automatic dispensing systems. In addition to edge coating, edge bead removal and puddle development, further options are available.